EDN

IMEC details high-k metal gate planar CMOS progress

At the IEEE International Electron Devices Meeting being held this week, Leuven, Belgium-based nanotechnology research center IMEC is reporting significant progress in improving the performance of ...
EDN

IMEC outlines nickel-silicide metal-gate CMOS

LONDON — Belgian research organization IMEC has presented on a scheme to use fully-silicided (FUSI) nickel-silicide metal gates with high-k dielectric CMOS transistors at the International Electron ...
Design-Reuse

Tech Tour of Metal Gate I/O Transistors

No one talks about the workhorse of the metal gate CMOS transistors -- the input/output (I/O) transistor. TechInsights thinks they are worth a look. Much has been written about metal gate CMOS ...
Semiconductor Engineering

Designing into A Foundry Low-Power High-k Metal Gate 28nm CMOS Solution

28nm Super Low Power is the low power CMOS offering delivered on a bulk silicon substrate for mobile consumer and digital consumer applications. The 28nm process technology is slated to become the ...
Design-Reuse

BCD Technology: A Unified Approach to Analog, Digital, and Power Design

Since its inception, BCD technology has leveraged the integration of two primary technologies—polysilicon gate CMOS and DMOS power architecture—on the same chip. Its compatibility with bipolar ...
Electronic Design

Layout-Dependent Modeling Boosts CMOS Gate Density

A layout-dependent circuit-design model from Toshiba helps boost gate density and improve cost-performance in next-generation 45-nm CMOS technology. More specifically, 45-nm CMOS gate density can be 2 ...